白皮书
Introduction
Accurate DC/CV (and RF) statistical modeling of CMOS devices requires collecting a signiicant amount of measured data from different wafers across several temperatures. DC and RF device modeling teams must adopt a modeling low that includes a sophisticated automated measurement solution and eficient data handling capabilities to support advanced statistical analysis and modeling (Figure 1). Automated measurement software must combine the ability to drive probers, switching matrixes and thermal chucks according to a predeined wafer map, with the ability to run complex DC/ CV and RF measurements using a variety of instruments—from parametric testers to single box instruments. Furthermore, measured data must be processed upon measurement to calculate Electrical Test (ET) data, such as Vth, Idmax, or fT .
by Roberto Tinti*, Francois Paolini† , Takashi Eguchi*, Franz Sischka* *Keysight Technologies, † ST Microelectronics
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