应用文章
The continuing trend of decreasing device geometries of the next generation of ULSI devices is making precise characterization evaluation of semiconductor devices more and more critical.
Measurement of capacitance is used to determine oxide thickness, one of the key parameters of semiconductor devices. This oxide thickness is becoming thinner and thinner from generation to generation. Therefore, accurate capacitance measurement is very important in semiconductor process integration and process monitoring.
The Keysight 4080 series of parametric test systems perform accurate capacitance measurements, reliably and quickly.
In order for 4080 series test systems to perform such precise measurements, appropriate fixturing and measurement techniques are required.
This application note describes the procedures required to precisely evaluate the capacitance of a Device Under Test (DUT) when using a 4080 series test system with an automatic wafer prober.
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